Available in Americas only
Overview
A new lithography inspection platform designed to improve product yield by capturing yield-limiting defects.
The Nikon P3 system is designed for automated pattern profile management and line width roughness monitoring of 300mm wafers with fully incorporated macro defect detection, EBR inspection, and automatic defect classification for unsurpassed performance down to the 55nm node.
Categories: Semiconductor Equipment
Applications: Wafers
