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Nikon Optistation-3100 Wafer Inspection System

Optistation-3100 Specifications

Wafer size: 300mm
Microscope (micro) inspection: Total Magnification: 25x to 1500x; Inspection modes: Brightfield, darkfield, DUV (option); Autofocus: LED illumination slit projection; Objectives: CFI60 objectives
Macro inspection: Surface Macro, center backside Macro, perimeter backside Macro
Load port: 1 foup (or 1 FOSB: option); Position selectable from front, side or rear
Wafer transfer: Robotic handling; vacuum chuck; noncontact pre-alignment mechanism
Operation: Touch panel GUI, mouse, keyboard
Options: DUV microscope: Switchable to B/D; Online operation: Via SECS-I or HSMS; Communication with host computer: 300mm SEMI standards (Complaint with E5, E7, E30, E37, E39, E40, E87, E90, E94); Others: FOSB compliance, ULPA boronless FFU (fan filter unit), Video capture function, 2nd user interface (UIF), OHV (SEMI E84 compliance), Review inspection, ADC, OCR
Safety: S2-0200 compliance, CE marking compliance
Ergonomic: S8-1000 compliance
Dimensions (W x D x H): 1785 x 1650 x 2300mm; Rear load port: 70.1 x 65.0 x 90.6 in.
Weight: Main body: Approx. 760kg (1676 lb); FFU unit: Approx. 160kg (353 lb)

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