Allows surface Macro, center backside Macro, and perimeter backside Macro inspections. Furthermore, the wide illuminator WIL-100 and the line illuminator LIL-100 have been newly developed to detect various process defects.

The Optistation-3100 features a SEMI and SELETE compliant design to enable easy adaptation to diverse 300mm factory automation requirements.

With load port positions available in the front, side and rear, the Optistation-3100 is adaptable to diverse fab layouts and 300mm factory automation requirements. What's more, it features a smaller footprint and compact design.

Automated, motorized functions controlled by an easily accessible touchscreen ensure comfortable operation while minimizing contamination. Optimum observation settings, including aperture and light intensity, can be preset according to objective lens or wafer type.

An integrated environmental chamber and FFU (fan filter unit) prevent contamination by particles, easily ensuring a class 1 inspection environment.

Nikon’s renowned CFI60 optics produce crisp, clear images with high contrast and minimal flare. Longer working distances throughout the magnification range ensure safer wafer inspection. The darkfield signal-to-background ratio is three times higher than in the past, ensuring significantly better imaging.

The newly designed DUV microscope module supports 90nm and future design rules.