Key Features
Expand All
open
Type 1,2,3 Models
- 1200 x 720mm stage travel is more than adequate to handle large flat panels, shadow masks, etching sheets for lead frames, LCDs, mask patterns, and other large work-pieces; 150mm Z-axis stroke; bright diascopic illumination
- 3 models (type: 1, 2, 3) with 5 step zoom magnification to cover different fields of view and resolution requirements
- Laser AF also enables measurements of height variance and warping in workpieces
- Search function facilitates measurements of lands and holes of PCBs
- Variety of illumination choices facilitate accurate edge detection even for vague geometries
- High-speed stage and high-speed image processing provide high throughput
open
Z120X Model (with Maximum Magnification Module)
- Achieves ultra-high magnification measurements with a long 1200 x 720mm stage stroke. Ideal for measuring minute line widths of large-size display panels.
- Automatic measurements of batches of small parts
- Laser AF achieves high-accuracy measurements of bump heights
- Laser AF enables measurements of height variance and warping in workpieces
- Search function enables measurements of lands and holes of PCBs
- Search function also provides accurate measurements even when workpieces are not located properly on the stage
- Variety of illumination choices facilitate accurate edge detection even for weak edges
- High-speed stage and image processing provide higher throughput
- Ideal for LCD glass substrates (pattern measurements) and organic EL glass substrates (pattern measurements)
open
LU Model (universal epi-illuminator/motorized nosepiece)
- Full range of Nikon CFI60 LU microscope objectives from 5x to 150x
- Supports brightfield, darkfield, DIC, simple polarizing applications
- Motorized quintuple universal nosepiece
- Easy to use software controls all functions of the system
